Influences of working pressure on properties for TiO2 films deposited by DCpulse magnetron sputtering
ZHANG Can , DING Wanyu , WANG Hualin , CHAI Weiping , JU Dongying
DOI:
Received ,Revised , Accepted , Available online
Volume 21,2009,Pages 741-744
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TiO2 films were deposited at room temperature by DC pulse magnetron sputtering system. The crystalline structures, morphological
features and photocatalytic activity of TiO2 films were systematically investigated by X-ray di raction (XRD), atomic force microscopy
(AFM) and ultraviolet spectrophotometer, respectively. The results indicated that working pressure was the key deposition parameter
influencing the TiO2 film phase composition at room temperature, which directly a ected its photocatalytic activity. With increasing
working pressure, the target self-bias decreases monotonously. Therefore, low temperature TiO2 phase (anatase) could be deposited with
high working pressure. The anatase TiO2 films deposited with 1.4 Pa working pressure displayed the highest photocatalytic activity by
the decomposition of Methyl Orange solution, which the degradation rate reached the maximum (35%) after irradiation by ultraviolet
light for 1 h.
